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Updated: May 25, 2025
From these data it is evident that in order to deposit copper from a normal solution of copper sulphate a minimum potential equal to the algebraic sum of the deposition-potentials of copper ions and sulphate ions must be applied, that is, +1.56 volts.
Approximate deposition-potentials have been determined for a number of the metallic elements, and also for hydrogen and some of the acid-forming radicals. The values given below are those required for deposition from normal solutions at ordinary temperatures with reference to a hydrogen electrode.
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